File:Multi-patterning table.png
Summary
| Description |
English: Multi-patterning approaches are shown for different nodes, as cited in references. 7nm node could have a single 193i exposure replaced by EUV, but there are still added costs from the new infrastructure transition, throughput, defects, etc., which make two or three 193i exposures still cheaper. 5nm node adds even more exposures, as high-NA EUV has smaller field and suffers from telecentricity errors even with anamorphic optics. |
| Date |
2016-01-30 |
| Source | Excel table |
| Author | Guiding light |
Licensing
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Original upload log
The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2016-02-11 14:19 | 1813×379× (53873 bytes) | Guiding light | |
| 2016-02-11 01:54 | 1813×379× (53945 bytes) | Guiding light | Updated 5nm with reference |
| 2016-02-11 01:11 | 1766×321× (47234 bytes) | Guiding light | Updated 7nm with reference |
| 2016-02-10 15:47 | 1766×292× (42476 bytes) | Guiding light | Updated 5nm with reference |
| 2016-01-31 12:32 | 1766×263× (38059 bytes) | Guiding light | updated 5nm with reference |
| 2016-01-31 07:28 | 1766×263× (39030 bytes) | Guiding light | updated 5nm with reference |
| 2016-01-30 13:17 | 1779×263× (39171 bytes) | Guiding light | Added 5nm |
| 2016-01-30 09:17 | 1668×206× (29562 bytes) | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |