File:Micro-Pillar.jpg
| Uploaded by | Mgerlt |
|---|---|
| Upload date | 2019-12-13T14:37:53Z |
| MIME type | image/jpeg |
| Dimensions | 4096 × 3775 px |
| File size | 7.8 MB |
Summary
| Description |
English: Inductively Coupled Plasma - Deep Reactive Ion Etching (ICP-DRIE) of micro-pillars in silicon. The Bosh-processed typically used in these machines leads to very fine grooves also called scallops. They are clearly visible in this SEM image. What can also be seen is the etch angle of the process leading to a smaller width at the bottom. |
| Date | |
| Source | Own work |
| Author | Mgerlt |
Licensing
I, the copyright holder of this work, hereby publish it under the following license:
This file is licensed under the Creative Commons Attribution 4.0 International license.
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- to share – to copy, distribute and transmit the work
- to remix – to adapt the work
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This image was uploaded as part of Wiki Science Competition 2019. |